Imec demoes 22nm pitch on single-print high-NA step

Executive Briefing & Key Highlights

Imec has demonstrated the feasibility of patterning tight-pitch random logic structures after a CAR-based single-print High NA EUV lithography step. Logic structures include lines/spaces down to 22nm pitch, and vias […] The post Imec demoes 22nm pitch on single-print high-NA step appeared first on Electronics Weekly.