Back to Opportunities
A
ASML EUV Lithography Systems R&D Specialist
ASML
FellowshipOfficial Link Verified60 days left
Deadline in 60 days
Description
R&D engineering for High-NA Twinscan EUV systems. Sub-nanometer mirror positioning, laser-produced plasma (LPP) light sources, and wafer stage control dynamics.
Eligibility
- M.Sc / PhD in Physics / Optical Engineering / Mechatronics.
Quick Facts
Position Type
Fellowship
Organization Type
Research
Work Location
Veldhoven, Netherlands
Compensation / Stipend
€65,000 - €95,000/year
Apply NowAdd to Calendar
Save Share
Quick Facts
Location
Veldhoven, Netherlands
Type
Fellowship
Deadline
15 Oct 2026
Stipend
€65,000 - €95,000/year
Org. Type
Research
AI Analysis & Insights
Analyzing...
Before you apply
- • Always verify details on the official website
- • Check for any updates or changes to the advertisement
- • Deadlines and eligibility criteria may have changed
- • BerojgarDegreeWala aggregates publicly available information